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EpiCentre 100 Photo Gallery |
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Typical EpiCentre 100 stage
used for UHV deposition onto 150mm wafers. The stage has heating,
rotation and a single "Z" shift for adjusting the deposition
level. |
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Basic
EpiCentre 100 for MBE deposition on to 100mm wafers. The instrument has a
single "Z" shift for creating access between the heater and sample
cradle. |
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EpiCentre 100 stage with dual
bellows coupled through a single actuator. This arrangement
provides the wafer hand-off motion required for production applications. |
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Fully
fitted EpiCentre 100 with heating, wafer RF biasing, rotation and two
"Z" shifts for performing wafer hand-off routines as well as
adjustment of the deposition level. The instrument was fitted to a UHV
sputtering system. |
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The ultimate EpiCentre 100.
Fitted with quartz enclosed heater module and dedicated pumping,
rotation, DC biasing, motorised "Z" motions for automated
hand-off and manual "Y" shift adjustment for transfer system
alignment.
On the right is a close up of the
quartz enclosed heater module.
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