Electrical biasing is also available, DC and/or RF, to facilitate sputter cleaning prior to deposition or for better control of deposition kinetics. ‘Faraday Dark Space Shielding’ is supplied as standard on all biased stages. This confines plasma to the substrate cradle region. Our proprietary substrate biasing technology provides unrivalled flicker-free performance, typically with zero maintenance and long operational life. X, Y and Z motion can then be added to tailor the stage to meet your specific application.
The concept of this stage was strongly influenced by a complete review of existing right-angled deposition stages to provide unrivalled performance and durability.
By stacking two magnetically-coupled MagiDrive rotary feedthroughs, UHV Design are able to achieve a dual axis, concentric rotation system which eliminates the head positioning gear train typically used in other designs.
The absence of any bellows, O-rings or dynamic seals ensures clean, true UHV performance with high reliability making them ideal for critical applications.
Secure Sample Transfer
Using our range of magnetically coupled sample transfer arms with secure bayonet style sample holder provides reliable and secure sample transfer.
High temperature heating
By incorporating our latest heater module technology into this stage, improvements upon conventional designs have been achieved in terms of the ultimate temperature capability and uniformity and therefore deposition uniformity. Significant technology resides within the rotary head which enables continuous azimuthal rotation with high precision positioning whilst heating from ambient to 1200oC.
Refractory metal deposition shielding is provided as standard to protect the heating module.
The EC-R can also be configured specifically as a retrofit instrument for MBE systems such as the VG Semicon V80H.
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