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EpiCentre deposition stages

The EpiCentre range of deposition stages employs cutting -edge design and engineering technology to give high temperature, uniform and durable substrate heating with precise manipulation under true UHV conditions.

EpiCentres have been designed for deposition applications such as MBE (Molecular Beam Epitaxy), sputtering and CVD (Chemical Vapour Deposition). Substrate annealing, degassing and other high temperature material modifications can also be performed. 

EpiCentres can be mounted in any-orientation to suit customer chamber designs and application configurations. 

The EpiCentre range has been used by pioneering research laboratories around the world for many years. End user references are available for a variety of applications and substrate types and size

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Key features

  • Choice of in-line, right-angle and glancing angle configurations
  • High uniformity substrate heating to 1200°C
  • RF & DC substrate biasing with ultra-stable plasma
  • Substrate rotation to 60rpm
  • Modular design allows application specific configuration
  • Substrate sizes up to 8"
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Click on the links below to learn more or contact us for more information.