EC-R series

Tailored for specific applications

Electrical biasing is also available (DC and/or RF). This can facilitate sputter cleaning prior to deposition or for better control of deposition kinetics. ‘Faraday Dark Space Shielding’ is supplied as standard on all biased stages. This confines plasma to the substrate cradle region. Our proprietary substrate biasing technology provides unrivalled flicker-free performance, typically with zero maintenance and long operational life. X, Y and Z motion can then be added to tailor the stage to meet your specific application.

Unrivalled performance and durability

This stage was born from a complete review of existing right-angled deposition stages. Rethinking the concept completely, the EC-R provides unrivalled performance and durability. By stacking two magnetically-coupled MagiDrive rotary feedthroughs, UHV Design is able to achieve a dual-axis, concentric rotation system. This eliminates the head positioning gear train typically used in other designs. 

Secure Sample Transfer

The absence of any bellows, O-rings or dynamic seals ensures clean, true UHV performance with high reliability. Magnetically coupled sample transfer arms with secure bayonet-style sample holders provide reliable and secure sample transfer. This makes EC-r the ideal choice for critical applications.

High-temperature heating

By incorporating our latest heater module technology into this stage, we’ve achieved radical improvements to conventional designs. This is in terms of the ultimate temperature capability and uniformity. Consequently, this positively affects deposition uniformity. There’s significant technology within the rotary head to enable continuous azimuthal rotation with high precision positioning - all whilst heating from ambient to 1200oC. As standard, refractory metal deposition shielding is provided to protect the heating module. The EC-R can also be configured specifically as a retrofit instrument for MBE systems, e.g. VG Semicon V80H. 

Series options

1. Azimuthal rotation

Continuous azimuthal rotation to maximise temperature and deposition uniformity. Smooth, long-life rotation, typically up to 20rpm tolerant of high temperatures. 

2. Polar rotation

Provides the ability to tilt the sample with respect to a deposition flux. 

3. Thermocouple options

Type C and Type K options available with choice of UHV and HV fittings and height adjustment. HV versions include an o-ring sealed connector allowing thermocouple position to be adjusted to match the pyrometer reading of the substrate temperature, eliminating the need for calibration adjustments.

4. DC & RF bias

Our proprietary substrate biasing technology provides unrivalled flicker-free performance, typically with zero maintenance and long operational life. 

5. Z motion

Use of UHVD's linear shift mechanism to provide Z motion with strokes from 50 - 300mm and motorisation options. 

6.  XY motion

Precise X & Y motion up to +/- 19mm (+/-27mm vector) with motorisation options.

7. Solid Silicon Carbide heater element

Solid SiC heaters are manufactured from a conducting solid SiC material in the ß phase and are more robust in all respects. They are durable under mechanical or electrical shocking and when exposed to reactive gases including oxidising atmospheres at high temperature. They are also optimised to give the very best in temperature uniformity.