EC-R series

Continuous substrate rotation, tilt, heating and electrical biasing

The EC-R supports the substrate at a right-angle to the plane of the mounting flange. It can then provide continuous substrate rotation, tilt, heating and electrical biasing. The EC-R can be mounted on UHVD's range of manipulators to provide motion in the X, Y and Z axes. The base EC-R configuration provides polar rotation to adjust the angle of incidence (with respect to the deposition flux and sample heating). The modular EC-R concept provides the flexibility to select options such as azimuthal rotation (to continuously rotate the substrate to maximise temperature) and deposition uniformity.

Key Specifications

  • 2" to 6" substrate diameters
  • Substrate heating to 1200°C
  • Continuous azimuthal rotation
  • Polar rotation (tilt) up to +/- 180°
  • DC/RF substrate biasing
EC-R series

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Tailored for specific applications

Electrical biasing is also available (DC and/or RF). This can facilitate sputter cleaning prior to deposition or for better control of deposition kinetics. ‘Faraday Dark Space Shielding’ is supplied as standard on all biased stages. This confines plasma to the substrate cradle region. Our proprietary substrate biasing technology provides unrivalled flicker-free performance, typically with zero maintenance and long operational life. X, Y and Z motion can then be added to tailor the stage to meet your specific application.

Unrivalled performance and durability

This stage was born from a complete review of existing right-angled deposition stages. Rethinking the concept completely, the EC-R provides unrivalled performance and durability. By stacking two magnetically-coupled MagiDrive rotary feedthroughs, UHV Design is able to achieve a dual-axis, concentric rotation system. This eliminates the head positioning gear train typically used in other designs. 

Secure Sample Transfer

The absence of any bellows, O-rings or dynamic seals ensures clean, true UHV performance with high reliability. Magnetically coupled sample transfer arms with secure bayonet-style sample holders provide reliable and secure sample transfer. This makes EC-r the ideal choice for critical applications.

High-temperature heating

By incorporating our latest heater module technology into this stage, we’ve achieved radical improvements to conventional designs. This is in terms of the ultimate temperature capability and uniformity. Consequently, this positively affects deposition uniformity. There’s significant technology within the rotary head to enable continuous azimuthal rotation with high precision positioning - all whilst heating from ambient to 1200oC. As standard, refractory metal deposition shielding is provided to protect the heating module. The EC-R can also be configured specifically as a retrofit instrument for MBE systems, e.g. VG Semicon V80H. 

Series options

1. Azimuthal rotation

Continuous azimuthal rotation to maximise temperature and deposition uniformity. Smooth, long-life rotation, typically up to 20rpm tolerant of high temperatures. 

2. Polar rotation

Provides the ability to tilt the sample with respect to a deposition flux. 

3. Thermocouple options

Type C and Type K options available with choice of UHV and HV fittings and height adjustment. HV versions include an o-ring sealed connector allowing thermocouple position to be adjusted to match the pyrometer reading of the substrate temperature, eliminating the need for calibration adjustments.

4. DC & RF bias

Our proprietary substrate biasing technology provides unrivalled flicker-free performance, typically with zero maintenance and long operational life. 

5. Z motion

Use of UHVD's linear shift mechanism to provide Z motion with strokes from 50 - 300mm and motorisation options. 

6.  XY motion

Precise X & Y motion up to +/- 19mm (+/-27mm vector) with motorisation options.

7. Solid Silicon Carbide heater element

Solid SiC heaters are manufactured from a conducting solid SiC material in the ß phase and are more robust in all respects. They are durable under mechanical or electrical shocking and when exposed to reactive gases including oxidising atmospheres at high temperature. They are also optimised to give the very best in temperature uniformity. 

Ecr sample transfer 2018 web

Technical Specification

Substrate diameter 50mm (2") 100mm (4") 150mm (6")
CF150/8" OD system flange Available Not available Not available
CF200/10" OD system flange Available Available Not available
CF250/12" OD system flange Available Available Available
Polar Rotation    
Adjustable position Manual (1° resolution)  
Heater element Silicon Carbide coated graphite (SiCg) as standard (see options below)
Achievable temperature 1200°C (based on heating a Molybdenum sample)
TILT Rotation    
Stepper motorised 0.025° resolution  
Azimuthal Rotation    
Manually driven Manual thimble  
DC motorised Up to 60rpm (maximum 20rpm recommended with bias)
Stepper motorised Up to 60rpm (maximum 20rpm recommended with bias) 
XYZ Motion Options XL-T Range XL-R Range  
Z axis      
Z stroke range offered 50-300mm 50-1000mm  
Resolution manual 0.01mm 1mm  
Resolution stepper motorised 0.001mm 0.001mm  
XY axis      
Manual actuation +/- 15mm (+/-21mm vector) +/- 19mm (+/-27mm vector)
    X-Y resolution manual 0.001mm 0.01mm  
Motorised actuation +/- 14mm (+/-20mm vector) +/- 18mm (+/-25.5mm vector)
    X-Y Resolution stepper motorised 0.0025mm 0.005mm  
Adjustable position (manual) +/-2° N/A  
DC & RF bias DC bias ≤ 1kV, RF ≤ 40W (including dark space shielding)
Heater element  Solid Silicon Carbide (sSiC)
Insertion length (nominally 240mm) Customer specified  
Motorisation  Stepper or Smart Motor (DC only for azimuthal)
X,Y and Z encoders Option     
Azimuthal home position sensor Option     
Temperature measurement Type K or Type C thermocouple
Water cooling of head assembly (NOT substrate) to aid heat dissipation Option     

If you would like to discuss your project with our engineering team, please contact us.