EC-I series
State-of-the-art performance for growth and deposition
Deposition Stages for UHV Applications
The EpiCentre range of deposition systems combines advanced engineering with state-of-the-art design to deliver precise substrate heating, positioning, and manipulation in ultra-high vacuum (UHV) environments. Available with a range of motorisation and automation options, and configurable with multiple axes of motion, EpiCentre stages provide enhanced process control, precise substrate positioning, remote operation, and seamless integration into automated deposition systems. Designed for high-performance thin-film deposition processes, these advanced deposition stages offer uniform, stable, and durable substrate heating, ensuring exceptional process consistency and repeatable results. Ideal for applications including Molecular Beam Epitaxy (MBE), sputtering, and Chemical Vapour Deposition (CVD), the EpiCentre range supports the demanding requirements of both cutting-edge research and industrial production environments.
By combining precise motion control with reliable substrate heating, EpiCentre deposition stages enable researchers and manufacturers to optimise process accuracy, improve repeatability, and increase productivity in advanced vacuum coating and thin-film deposition applications. Their flexible configuration options make them suitable for a wide range of research, development, and production environments where precision, reliability, and automation are essential.
Key Features
- Versatile Configurations: Available in in-line, right-angle, and glancing angle configurations to accommodate various deposition setups and UHV systems.
- High-Precision Substrate Heating: Provides high uniformity substrate heating up to 1200°C, essential for consistent material deposition and thin film growth.
- Cooling and Heating Options: The EC-I series includes options for both cooling and heating, allowing precise temperature control throughout the deposition process, enhancing performance.
- Advanced Biasing: RF and DC substrate biasing with ultra-stable plasma ensures optimal deposition conditions and high-quality thin films for advanced material science applications.
- Rotational Capability: Substrate rotation of up to 60rpm enables thorough and even deposition across the entire substrate surface, ensuring uniform coatings.
- Modular Design: Customisable modular design allows for application-specific configurations to meet diverse needs, from small-scale research to large-scale manufacturing.
- Large Substrate Capacity: Accommodates substrates up to 8 inches in diameter for larger-scale applications, expanding its versatility.
- Complete Temperature Control: The Cooled EC-I series offers continuous substrate rotation and precise heating and cooling. This system utilises a novel sample holder design for uniform cooling, ensuring high-temperature stability and consistent performance during the deposition process.
Designed for Various Applications:
The EpiCentre deposition stages are engineered for a wide range of deposition applications, including MBE, sputtering, CVD, substrate annealing, degassing, and other high-temperature material modifications. The stages can be mounted in any orientation, making them adaptable to custom chamber designs and specific application configurations, enhancing their utility across different industries.
Deposition Stages for UHV Applications series and product options
If you would like to discuss your project with our engineering team, please contact us.