To facilitate sample transfer the stage head is retracted as shown on the main image. This allows the substrate holder to be placed on the holder manually with the chamber at atmosphere or by using a transfer arm under vacuum.
In heating mode, the substrate can be rotated at 20rpm whilst heating to 800 oC. 1kV DC, 100W RF bias can be applied in this mode.
Novel dynamic sample holder provides uniform cooling of the static substrate using cooled water for rapid wafer quench or LN2 for cryogenic wafer cooling to -100oC.
Stage head retracted for sample transfer