Cooled EC-I series

The Cooled EC-I series (CEC-I) provides state-of-the-art performance for various growth and deposition techniques including MBE, sputtering and CVD.

CEC-I offers continuous substrate rotation, high temperature and high uniformity heating with the ability to statically cool a substrate using our novel sample holder design to provide uniform cooling.  CEC-I also offers 1kV DC & 100W RF biasing with facilities for substrate transfer, while maintaining true UHV compatibility.  

CEC-I is designed to accept SEMI standard 6" wafers.    

Sample transfer

To facilitate sample transfer the stage head is retracted as shown on the main image. This allows the substrate holder to be placed on the holder manually with the chamber at atmosphere or by using a transfer arm under vacuum. 

Heating mode

In heating mode, the substrate can be rotated at 20rpm whilst heating to 800 ^oC. 1kV DC, 100W RF bias can be applied in this mode. 

Cooling mode

Novel dynamic sample holder provides uniform cooling of the static substrate using cooled water for rapid wafer quench or LN2 for cryogenic wafer cooling to -100^oC.

Rapid Wafer Quench

Cryogenic wafer cooling