Deposition stages

Deposition stages

The EpiCentre range of deposition stages employs cutting -edge design and engineering technology to give high temperature, uniform and durable substrate heating with precise manipulation under true UHV conditions.

EpiCentres have been designed for deposition applications such as MBE (Molecular Beam Epitaxy), sputtering and CVD (Chemical Vapour Deposition). Substrate annealing, degassing and other high temperature material modifications can also be performed. 

EpiCentres can be mounted in any-orientation to suit customer chamber designs and application configurations. 

Download the EPICENTRE brochure

Key features

  • Choice of in-line, right-angle and glancing angle configurations
  • High uniformity substrate heating to 1200°C
  • RF & DC substrate biasing with ultra-stable plasma
  • Substrate rotation to 60rpm
  • Modular design allows application specific configuration
  • Substrate sizes up to 8"

 

ECI | In-Line Substrate Heater Stage



In-Line Sample Transfer Animation

 

Learn more about In-Line Deposition Stages

 

ECR | Right Angle Substrate Heater Stage



Right Angle Sample Transfer Animation

 

Learn more about Right-Angled Deposition Stages

Click on the links below to learn more or contact us for more information.

EC-I series

An in-line design presenting the substrate parallel to the mounting flange wi...
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EC-R series

Substrate at right angle to plane of mounting flange.
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GLAD series

Substrate at a variable glancing angle to the mounting flange.
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EPS series

Substrate parallel to plane of mounting flange.
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