Deposition applications such as MBE (Molecular Beam Epitaxy), sputtering and CVD (Chemical Vapour Deposition) require the ability to manipulate, rotate, bias and heat the substrate, often in the presence of Oxygen.
Our Epicentre range of deposition stages employs cutting-edge design and engineering technology to give high temperature, uniform and durable substrate heating with precise manipulation under true UHV conditions.

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Key Features

  • Choice of in-line, right-angle and glancing angle configurations
  • High uniformity substrate heating to 1200oC
  • RF & DC substrate biasing with ultra-stable plasma
  • Substrate rotation to 60rpm
  • Modular design allows application specific configuration
  • Substrate sizes up to 8"

Cathodic Arc Deposition

In-Line substrate heating stage specifically designed for Cathodic Arc Deposi...
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EC-I series

An in-line design presenting the substrate parallel to the mounting flange wi...
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EC-R series

Substrate at right angle to plane of mounting flange.
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EPS series

Substrate parallel to plane of mounting flange.
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