The EpiCentre range of deposition stages employs cutting -edge design and engineering technology to give high temperature, uniform and durable substrate heating with precise manipulation under true UHV conditions.

EpiCentres have been designed for deposition applications such as MBE (Molecular Beam Epitaxy), sputtering and CVD (Chemical Vapour Deposition). Substrate annealing, degassing and other high temperature material modifications can also be performed.

Key Features

  • Choice of in-line, right-angle and glancing angle configurations
  • High uniformity substrate heating to 1200°C
  • RF & DC substrate biasing with ultra-stable plasma
  • Substrate rotation to 60rpm
  • Modular design allows application specific configuration
  • Substrate sizes up to 8"