The EpiCentre range of deposition stages employs cutting -edge design and engineering technology to give high temperature, uniform and durable substrate heating with precise manipulation under true UHV conditions.
The new 'Cooled EC-I series' offers offers continuous substrate rotation, high temperature and high uniformity heating with the ability to statically cool a substrate using our novel sample holder design to provide uniform cooling.
EpiCentres have been designed for deposition applications such as MBE (Molecular Beam Epitaxy), sputtering and CVD (Chemical Vapour Deposition). Substrate annealing, degassing and other high temperature material modifications can also be performed.
EpiCentres can be mounted in any-orientation to suit customer chamber designs and application configurations.
Download the EPICENTRE brochure